Title: Nanoscale CMOS VLSI Circuits : Design for Manufacturability Author: Aswin Sreedhar, Sandip Kundu ISBN: 007163519X / 9780071635196 Format: Hard Cover Pages: 316 Publisher: McGraw-Hill Year: 2010 Availability: 45-60 days
Description
Contents
Cutting-Edge CMOS VLSI Design for Manufacturability Techniques
This detailed guide offers proven methods for optimizing circuit designs to increase the yield, reliability, and manufacturability of products and mitigate defects and failure. Covering the latest devices, technologies, and processes, Nanoscale CMOS VLSI Circuits: Design for Manufacturability focuses on delivering higher performance and lower power consumption. Costs, constraints, and computational efficiencies are also discussed in the practical resource.
Nanoscale CMOS VLSI Circuits covers:
Current trends in CMOS VLSI design
Semiconductor manufacturing technologies
Photolithography
Process and device variability: analyses and modeling
Manufacturing-Aware Physical Design Closure
Metrology, manufacturing defects, and defect extraction
Defect impact modeling and yield improvement techniques
Physical design and reliability
DFM tools and methodologies
Preface
Chapter 1 : Introduction Chapter 2 : Semiconductor Manufacturing Chapter 3 : Process and Device Variability : Analysis and Modeling Chapter 4 : Manufacturing-Aware Physical Design Closure Chapter 5 : Metrology, Manufacturing Defects, and Defect Extraction Chapter 6 : Defect Impact Modeling and Yield Improvement Techniques Chapter 7 : Physical Design and Reliability Chapter 8 : Design for Manufacturability : Tools and Methodologies