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Chemical Vapor Deposition

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Title: Chemical Vapor Deposition
Author: Jong-Hee Park. Series Editor: T.S. Sudarshan
ISBN: 087170692X / 9780871706928
Format: Hard Cover
Pages: 481
Publisher: ASM International
Year: 2001
Availability: Out of Stock
     
 
  • Description
  • Contents

Surface modification through chemical vapor deposition is becoming increasingly important in extending service life of many parts exposed to severe environmental conditions.

KEY FEATURES: Provides detailed descriptions of several novel methods of application of CVD technology.

DESCRIPTION: This reference book presents the basic principles and process characteristics of chemical vapor deposition, as well as the details of several innovative approaches to its application in a wide variety of industrial applications.

AUDIENCE: Process and applications engineers and researchers who are involved in deposition of surface coatings.

Introduction
Basic Principles, Thermodynamics, and Kinetics
Stresses and Mechanical Stability
Combustion Chemical Vapor Deposition
Polarized Electrochemical-Vapor Deposition
Chemical Vapor Infiltration
Metal-Organic CVD of High-Dielectric (Ba, Sr)TiO3 Thin Films for Dynamic
RAM Applications
CVD of Plastic and Polymers
CVD Diamond, Diamond-Like Carbon, and Carbonitride Coatings
CVD Films in Tribological Applications
CVD Films for Electrical-Insulation and Corrosion-Protection Coatings
Heat Treatment of CVD-Coated Tool Steels
Future Developments and Directions

 
 
 
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