Nanoscale CMOS VLSI Circuits : Design for Manufacturability

Cutting-Edge CMOS VLSI Design for Manufacturability Techniques

This detailed guide offers proven methods for optimizing circuit designs to increase the yield, reliability, and manufacturability of products and mitigate defects and failure. Covering the latest devices, technologies, and processes, Nanoscale CMOS VLSI Circuits: Design for Manufacturability focuses on delivering higher performance and lower power consumption. Costs, constraints, and computational efficiencies are also discussed in the practical resource.

Nanoscale CMOS VLSI Circuits covers:

• Current trends in CMOS VLSI design
• Semiconductor manufacturing technologies
• Photolithography
• Process and device variability: analyses and modeling
• Manufacturing-Aware Physical Design Closure
• Metrology, manufacturing defects, and defect extraction
• Defect impact modeling and yield improvement techniques
• Physical design and reliability
• DFM tools and methodologies

Preface

Chapter 1 : Introduction
Chapter 2 : Semiconductor Manufacturing
Chapter 3 : Process and Device Variability : Analysis and Modeling
Chapter 4 : Manufacturing-Aware Physical Design Closure
Chapter 5 : Metrology, Manufacturing Defects, and Defect Extraction
Chapter 6 : Defect Impact Modeling and Yield Improvement Techniques
Chapter 7 : Physical Design and Reliability
Chapter 8 : Design for Manufacturability : Tools and Methodologies

Index