This book contains comprehensive reviews of different technologies to harness lattice mismatch in semiconductor heterostructures and their applications in electronic and optoelectronic devices. While the book is a bit focused on metamorphic epitaxial growth, it also includes other methods like compliant substrate, selective area growth, wafer bonding and heterostructure nanowires etc. Basic knowledge on dislocations in semiconductors and innovative methods to eliminate threading dislocations are provided, and successful device applications are reviewed. It covers a variety of important semiconductor materials like SiGe, III-V including GaN and nano-wires; epitaxial methods like molecular beam epitaxy and metal organic vapor phase epitaxy; and devices like transistors and lasers etc.
Preface
Chapter 1 : Dislocation Reduction by Interfacial Misfit Method
Chapter 2 : Compliant Substrates
Chapter 3 : Selective Area Growth
Chapter 4 : Low Temperature Direct Wafer Bonding
Chapter 5 : Heterostructures and Strain Relaxation In Semiconductor Nanowires
Chapter 6 : Epitaxial Growth of Nitrides
Chapter 7 : Metamorphic HEMT Technology
Chapter 8 : Metamorphic Hbts, Metamorphic Quantum Dot Lasers
Chapter 9 : Metamorphic Quantum Well Lasers
Chapter 10 : Nitride Based LEDS And Laser Diodes
Index
