Characterization of Optical Materials

Optical materials are prized for their properties such as reflection, refraction, absorption, emission, scattering, and diffraction of light in wavelengths ranging from 100 nm to 10 mm. Because small surface or atomic structure defects can have significant affects on those properties, characterization techniques that are sensitive to structures at those scales are presented for the relative effectiveness and particular applications.

Inside you'll find:

• A review of surface roughness as it relates to desired optical properties
• Characterization of optical materials used for III-V semiconductor systems, group IV materials, and amorphous and microcrystalline semiconductors
• Coverage of on the stability and modification of film and surface optical properties, including optical coatings, optical films, and laser-induced damage to optical materials
• Concise summaries of major characterization technologies for integrated circuit packaging materials, including acoustic microscopy, atomic absorption spectrometry, Auger Electron Spectroscopy, Energy-Dispersive X-Ray Spectroscopy, and many more

Preface to the Reissue of the Materials Characterization Series
Preface to Series
Preface to the Reissue of Characterization of Optical Materials
Preface
Contributors

Chapter 1 : Introduction

Part I : Influence of Surface Morphology and Microstructure on Optical Response
Chapter 2 : Characterization of Surface Roughness
Chapter 3 : Characterization of the Near-Surface Region Using Polarization-Sensitive Optical Techniques
Chapter 4 : The Composition, Stoichiometry, and Related Microstructure of Optical Materials
Chapter 5 : Diamond as an Optical Material

Part II : Stability and Modification of Film and Surface Optical Properties
Chapter 6 : Multilayer Optical Coatings
Chapter 7 : Characterization and Control of Stress in Optical Films
Chapter 8 : Surface Modification of Optical Materials
Chapter 9 : Laser-Induced Damage to Optical Materials

Appendix Technique Summaries
1 : Auger Electron Spectroscopy (AES)
2 : Cathodoluminescence (CL)
3 : Electron Energy-Loss Spectroscopy in the Transmission Electron Microscope (EELS)
4 : Energy-Dispersive X-Ray Spectroscopy (EDS)
5 : Fourier Transform Infrared Spectroscopy (FTIR)
6 : Light Microscopy
7 : Modulation Spectroscopy
8 : Nuclear Reaction Analysis (NRA)
9 : Optical Scatterometry
10 : Photoluminescence (PL)
11 : Photothermal Displacement Technique
12 : Raman Spectroscopy
13 : Rutherford Backscattering Spectrometry (RBS)
14 : Scanning Electron Microscopy (SEM)
15 : Scanning Transmission Electron Microscopy (STEM)
16 : Scanning Tunneling Microscopy and Scanning Force Microscopy (STM and SFM)
17 : Static Secondary Ion Mass Spectrometry (Static SIMS)
18 : Surface Roughness: Measurement, Formation by Sputtering, Impact on Depth Profiling
19 : Total Internal Reflection Microscopy
20 : Transmission Electron Microscopy (TEM)
21 : Variable-Angle Spectroscopic Ellipsometry (VASE)
22 : X-Ray Diffraction (XRD)
23 : X-Ray Fluorescence (XRF)
24 : X-Ray Photoelectron Spectroscopy (XPS)

Index